Title:
MULTIPLE ELECTRON BEAM INSPECTION DEVICE AND ADJUSTMENT METHOD THEREOF
Document Type and Number:
Japanese Patent JP2022034866
Kind Code:
A
Abstract:
To quickly align one desired beam among multiple beams with a small-diameter aperture.SOLUTION: A multiple electron beam inspection apparatus includes a first passage hole to allow all of multiple electron beams to pass, and a second passage hole to allow one beam among the multiple electron beams to pass, a beam selection aperture board in which a first slit and a second slit non-parallel to the first slit are provided, an aperture movement part to move the beam selection aperture board, a first detector to detect a current of the beams passing through the first slit and a current of the beam passing through the second slit, and a second detector to detect multiple secondary electron beams including reflection electrons emitted from the board which occurs due to the irradiation of the multiple electron beams passing though the first passage hole to the board, the multiple electron beam inspection apparatus performing inspection of the board on the basis of an output signal from the second detector.SELECTED DRAWING: Figure 1
Inventors:
ISHII KOICHI
INOUE KAZUHIKO
MIKAMI SHOHEI
AKIBA TOSHIKATSU
INOUE KAZUHIKO
MIKAMI SHOHEI
AKIBA TOSHIKATSU
Application Number:
JP2020138777A
Publication Date:
March 04, 2022
Filing Date:
August 19, 2020
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC
International Classes:
H01J37/09; H01J37/04; H01J37/244; H01J37/28; H01L21/66
Attorney, Agent or Firm:
Tsuyoshi Shigeno
Takayuki Shigeno
Takayuki Shigeno