Title:
マルチ電子ビーム検査装置
Document Type and Number:
Japanese Patent JP7194572
Kind Code:
B2
Abstract:
Provided is a multiple electron beam inspection apparatus including: an irradiation source irradiating a substrate with multiple electron beams; a stage on which is cable of mounting the substrate; an electromagnetic lens provided between the irradiation source and the stage, the electromagnetic lens generating a lens magnetic field, the multiple electron beams being capable of passing through the lens magnetic field; an electrostatic lens provided in the lens magnetic field, the electrostatic lens including a plurality of through-holes and a plurality of electrodes, the plurality of through-holes having wall surfaces respectively, each of the multiple electron beams being capable of passing through the corresponding each of the plurality of through-holes, each of the plurality of electrodes provided on each of the wall surfaces of the plurality of through-holes, at least one of the through-holes provided apart from a central axis of trajectory of the multiple electron beams having a spiral shape; and a power source connected to the electrodes.
Inventors:
Kazuhiko Inoue
Atsushi Atsushi
Ogasawara Munehiro
Atsushi Atsushi
Ogasawara Munehiro
Application Number:
JP2018227658A
Publication Date:
December 22, 2022
Filing Date:
December 04, 2018
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01J37/09; H01J37/12; H01L21/66
Domestic Patent References:
| JP2014127568A |
Foreign References:
| WO2019243349A2 | ||||
| WO2012081422A1 |
Attorney, Agent or Firm:
Torushin Ikegami
Akira Sudo
Masahiro Takashita
Akira Sudo
Masahiro Takashita