Title:
多階調フォトマスク、及びパターン転写方法
Document Type and Number:
Japanese Patent JP5372403
Kind Code:
B2
Abstract:
PURPOSE: A multi-gray photomask, a manufacturing method thereof, and a method for transferring the pattern are provided to design a gray tone part with plural transmissivity using a semi-transmissive layer with the required transmissivity. CONSTITUTION: A mask pattern is comprised of a shielding unit(11), a transmissive unit(12), and a semi-transmissive unit on a transparent substrate(14). The shielding unit is formed by a shielding layer(15) on the transparent substrate. The transmissive unit is formed by exposing the transparent substrate. A first semi-transmissive unit is comprised by forming a semi-transmissive layer on the transparent substrate. A second semi-transmissive unit has a minute pattern with a line width below the resolution limit under an exposure condition. The shielding layer is made of the material with chrome as a main component.
Inventors:
Michiaki Sano
Application Number:
JP2008119970A
Publication Date:
December 18, 2013
Filing Date:
May 01, 2008
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/00; G03F1/54; G03F1/58; G03F1/68; G03F1/80; H01L21/027
Domestic Patent References:
| JP2008046623A | ||||
| JP2005037933A | ||||
| JP2007256922A | ||||
| JP2009204934A | ||||
| JP2009192927A | ||||
| JP2008298932A | ||||
| JP2004200613A |
Attorney, Agent or Firm:
Takeshi Otsuka