Title:
プラズマＲＦ源測定用マルチレート処理
Document Type and Number:
Japanese Patent JP5631628
Kind Code:
B2
Abstract:
An RF generator is provided for use in an RF plasma system. The RF generator includes: a power source that is operable to generate RF power signals at a tuned frequency; a sensor unit that is adapted to detect the RF power signals and operable to generate analog signals representative of the RF power signals, where the analog signals include a frequency of interest and a plurality of interfering frequency components; and a sensor signal processing unit that is adapted to receive the analog signals from the sensor unit and to band limit the analog signals within a predefined bandwidth that passes the frequency of interest and rejects interfering frequency components.
Inventors:
コウモウ，デービッド，ジェー．
カーク，マイケル，エル．
カーク，マイケル，エル．
Application Number:
JP2010111764A
Publication Date:
November 26, 2014
Filing Date:
May 14, 2010
Export Citation:
Assignee:
エムケーエス インストゥルメンツ，インコーポレイテッド
International Classes:
H05H1/46; H01J37/32; H01L21/3065; H03H17/06
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki