Title:
アップフロー段蒸気の不純物を非接触除去する多段アップフローおよびダウンフロー水素化処理
Document Type and Number:
Japanese Patent JP4422909
Kind Code:
B2
Abstract:
A hydroprocessing process for removing impurities from a feed comprising a hydrocarbonaceous liquid comprises at least one cocurrent, upflow hydroprocessing reaction stage, a vapor-liquid contacting stage and a downflow hydroprocessing reaction stage. The feed and hydrogen react in the upflow stage to produce a partially hydroprocessed liquid and vapor effluent. The vapor contacts a hydrocarbonaceous liquid in the contacting stage, which transfers impurities from the vapor into the liquid. The impurity-enriched contacting liquid mixes with the upflow stage liquid effluent and the combined liquid effluents react with hydrogen in the downflow reaction stage, to form a hydroprocessed product liquid and vapor effluent. Additional product liquid is recovered by cooling and condensing either or both the contacting and downflow stage vapor effluents.
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Inventors:
Gapta, Ramesh
Application Number:
JP2000578402A
Publication Date:
March 03, 2010
Filing Date:
October 20, 1999
Export Citation:
Assignee:
EXXON RESEARCH AND ENGINEERING COMPANY
International Classes:
C10G65/02; C10G45/02; C10G65/04; C10G45/32; C10G45/44; C10G45/58; C10G47/00; C10G67/04; C10G73/02
Domestic Patent References:
| JP2001507738A | ||||
| JP2001507740A |
Foreign References:
| US5522983 |
Attorney, Agent or Firm:
Kenji Kawabi