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Title:
MULTIOXYGEN-CONTAINING COMPOUND, PHOTORESIST COMPOSITION, PHOTORESIST PATTERN FORMATION, AND SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2000191656
Kind Code:
A
Abstract:

To efficiently prevent the diffusion of an acid produced in exposure process by incorporating a photoresist composition with a crown ether or polyethylene glycol derivative as a multioxygen-contg. compoud.

The diffusion of an acid produced in exposure process is effectively prevented by incorporating a photoresist composition with a multioxygen- contg. compound, i.e., a crown ether of formula I (n is 1-5) or formula II ((a) to (c) are each 1-5) (e.g. 12-crown-4,[2.2.2]bicyclic crown ether) or a polyethylene glycol derivative of formula III [R1 and R2 are each a (substituted) 1-10C alkyl containing H and/or OH, or the like; m is 1-20] (e.g. polyethylene glycol, polyethylene glycol dimethyl ether). Being low in the absorbance for rays corresponding to an ultra-short wavelength region of ≤250 nm, the above crown ether or polyethylene glycol derivative never deteriorates the photosensitivity of a photoresist composition even if incorporated therein.


Inventors:
LEE GEUN SU
JUNG JAE CHANG
JUNG MIN HO
BOK CHEOL KYU
BAIK KI HO
Application Number:
JP1999000365147
Publication Date:
July 11, 2000
Filing Date:
December 22, 1999
Export Citation:
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Assignee:
HYUNDAI ELECTRONICS IND
International Classes:
C07D323/00; C07D493/08; G03F7/004; G03F7/038; G03F7/039; (IPC1-7): C07D323/00; C07D493/08
Attorney, Agent or Firm:
荒船 博司 (外1名)