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Title:
MULTIPLE-CHAMBER TYPE SEMICONDUCTOR MANUFACTURING APPARATUS
Document Type and Number:
Japanese Patent JPH0799224
Kind Code:
A
Abstract:

PURPOSE: To prevent cross contamination and the like between processing chambers by avoiding the mixing of gas and minute dust flowing out of the processing chamber, wherein the processing is finished, into the next or previous processing chamber in a multiple-chamber manufacturing apparatus, wherein the different processings are continuously performed.

CONSTITUTION: Two sets of opening parts 3a, 3b, 5a, 5b, 7a and 7b, wherein opening and closing shutters 2'-7' are provided, are formed in respective processing chambers 3, 5 and 7 of a multiple-chamber manufacturing apparatus. The two opening parts, e.g. 3a and 3b are connected to the mutually different conveying chambers 2 and 4. Thus, a wafer, which is carried into the processing chamber 3 from the conveying chamber, e.g. 2 and processed, is conveyed into the other conveying chamber 4. The wafer is sent into the other processing chamber 5 from the conveying chamber 4. Therefore, the atmosphere in the previous chamber 3 is not transferred into the processing chamber 5 before the processing.


Inventors:
OKUDAIRA SADAYUKI
TOMIOKA HIDEKI
ISHIKAWA KATSUHIKO
TANABE YOSHIKAZU
Application Number:
JP24126293A
Publication Date:
April 11, 1995
Filing Date:
September 28, 1993
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
B01L1/00; H01L21/302; H01L21/3065; H01L21/677; H01L21/68; (IPC1-7): H01L21/68; B01L1/00; H01L21/3065
Attorney, Agent or Firm:
Tomio Ohinata



 
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