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Title:
MULTIPLE GRADATION PHOTOMASK, METHOD OF MANUFACTURING MULTIPLE GRADATION PHOTOMASK, PATTERN TRANSFER METHOD, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR
Document Type and Number:
Japanese Patent JP2009258250
Kind Code:
A
Abstract:

To provide a multiple gradation photomask and a pattern transfer method to obtain a resist pattern with a steep profile.

The multiple gradation photomask arranged on a transparent substrate 11, and includes a transfer pattern having a translucent portion and a semi-translucent portion by respectively pattern-processing a semi-translucent film transmitting exposure light partly. The semi-translucent portion consists of a first semi-translucent film 12 having relatively low phase shift quantity in respect to a transparent substrate, and a second semi-translucent film 13 having relatively high phase shift quantity in respect to the first semi-translucent film 12.


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Inventors:
SANO MICHIAKI
NAKANISHI KATSUHIKO
YOSHIDA KOICHIRO
Application Number:
JP2008105249A
Publication Date:
November 05, 2009
Filing Date:
April 15, 2008
Export Citation:
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Assignee:
HOYA CORP
International Classes:
G03F1/00; G03F1/28; G03F1/32; G03F1/58; G03F1/68; G03F7/20; H01L21/027
Domestic Patent References:
JP2007249198A2007-09-27
JP2005165352A2005-06-23
JP2008052120A2008-03-06
JP2005107195A2005-04-21
JP2009086382A2009-04-23
JP2006268035A2006-10-05
JP2008065138A2008-03-21
JP2007249198A2007-09-27
JP2005165352A2005-06-23
JP2008052120A2008-03-06
JP2005107195A2005-04-21
JP2009086382A2009-04-23
JP2006268035A2006-10-05
Attorney, Agent or Firm:
Hiroyoshi Aoki
Amada Masayuki
Yoshimasa Okada
Toru Kanno



 
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