Title:
MULTIPLE SCANNING METHOD RELATIVE TO ANALYSIS OF WAFER PARTICLE
Document Type and Number:
Japanese Patent JPH07193109
Kind Code:
A
Abstract:
PURPOSE: To reduce aiming errors that are included in an estimate value of positions of particles on a wafer by averaging two sets of coordinate data, having a coordinate consistency regarding one and the same particle, so as to obtain a more accurate estimate value. CONSTITUTION: In this multiple scanning method, data obtained at least by two times of scanning that is conducted by placing a wafer in different crystal orientation directions preferably, that is, data obtained by a scanning 1 and a scanning 2 are averaged. That is, data obtained by all scanning except one scanning is at first transformed into data, so as to have a coordinate consistency with those of other scannings, then a matching particle in the twice scanning is confirmed, and the coordinate data by the two times of the scanning are averaged. The result by a laser scanning stage is used to calculate a more accurate coordinate transformation between a laser scanner and an image scanner. Then the coordinate of the particle is transformed into a coordinate system of the image scanner, so as to facilitate the position detection of the particle by the image scanner and the further analysis.
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Inventors:
PATORITSUKU DEII KINII
YURI ESU URISUKII
HARII KIYUU RII
YURI ESU URISUKII
HARII KIYUU RII
Application Number:
JP20768794A
Publication Date:
July 28, 1995
Filing Date:
August 31, 1994
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
G01N15/00; G01R31/305; G01R31/307; H01J37/22; H01L21/66; G01B11/00; (IPC1-7): H01L21/66; G01B11/00; G01N15/00; H01J37/22
Attorney, Agent or Firm:
Yoshiki Hasegawa (4 outside)