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Patent Searching and Data


Title:
MULTISTRUCTURAL HOLOGRAPHIC NOTCH FILTER AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2002328235
Kind Code:
A
Abstract:

To provide a holographic notch filter which has a narrower band width, can well remove the light at specified wavelengths and can be easily manufactured, and a method for manufacturing the filter.

The multistructural holographic notch filter 2 is manufactured by using a holographic recording material 4 in which refractive index modulation is recorded by a two-beam interference method. In this filter, a thin film filter element 6 is formed by recording the refractive index modulation by the two-beam interference method in a thin holographic recording material 4 to make a filter, and a plurality of the above thin film filter elements 6 are stacked to obtain the filter.


Inventors:
KAMENO ITSUHITO
YOSHIKI YASUNOBU
Application Number:
JP2001132313A
Publication Date:
November 15, 2002
Filing Date:
April 27, 2001
Export Citation:
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Assignee:
JASCO CORP
International Classes:
G02B5/32; G02B5/18; G02B5/20; G03H1/04; (IPC1-7): G02B5/32; G02B5/18; G03H1/04
Attorney, Agent or Firm:
Yuji Iwahashi