Title:
N-VINYLAMIDE BASED COPOLYMER, ITS MANUFACTURING METHOD AND USE THEREOF
Document Type and Number:
Japanese Patent JP2002308946
Kind Code:
A
Abstract:
To obtain an N-vinylamide based copolymer which has a salt resistance and resistance to alcohols, is useful as a polymer type surface active agent, and can be used in a wide field such as civil engineering and construction, resin production, coating, and petrochemistry.
The N-vinylamide based copolymer comprises 10-79 mol% vinyl esters represented by formula (1) and 21-90 mol% N-vinylamide and has a surface tension of a 1 mass% aqueous solution of the copolymer of ≤65 dyn/cm. The method for manufacturing the copolymer and its use are also disclosed.
Inventors:
WADA TETSUO
Application Number:
JP2001111931A
Publication Date:
October 23, 2002
Filing Date:
April 10, 2001
Export Citation:
Assignee:
SHOWA DENKO KK
International Classes:
C09K23/22; C08F2/00; C08F218/04; C08F226/02; C09D131/02; C09D139/00; C09K3/00; C09K17/20; C09K23/52; C09K103/00; (IPC1-7): C08F226/02; B01F17/22; B01F17/52; C08F2/00; C08F218/04; C09D131/02; C09D139/00; C09K3/00; C09K17/20
Domestic Patent References:
| JPH0770232A | 1995-03-14 | |||
| JPH1017622A | 1998-01-20 | |||
| JPH05294358A | 1993-11-09 | |||
| JPH1143374A | 1999-02-16 | |||
| JPH1129445A | 1999-02-02 |
Attorney, Agent or Firm:
Shinji Kakinuma