SURFACE TREATMENT BY USING ATOMSPHERIC PRESSURE PLASMA

Title:

SURFACE TREATMENT BY USING ATOMSPHERIC PRESSURE PLASMA

Document Type and Number:

Japanese Patent JPH0641755

Kind Code:

A

Abstract:

PURPOSE: To form a surface thin film on the body to be treated and/or to reform the surface by plasma by performing highly stable glow discharge under atmospheric pressure by using inexpensive dilution gas.

CONSTITUTION: Plasma is excited under atmospheric pressure by using dilution gas having the gas compsn. of 99.99-95vol%, preferably 99.99-99vol% argon, and 0.01-5vol%, preferably 0.01-1vol% lower aliphatic hydrocarbons (with the total 100vol%). Surface treatment under atmospheric pressure is performed by mounting the body 4 to be treated on the upper part of the lower electrode 2, introducing the dilution gas through an inlet 5, and discharging the gas through an outlet 6. The lower part of the upper electrode 1 and the upper part of the lower electrode 2 are covered with dielectric coating 3.

Inventors:

KOKOMA MASUHIRO
OKAZAKI SACHIKO
UCHIYAMA HIROSHI

Application Number:

JP5570191A

Publication Date:

February 15, 1994

Filing Date:

February 28, 1991

Export Citation:

Click for automatic bibliography generation Help

Assignee:

II C KAGAKU KK
OKAZAKI SACHIKO
KOKOMA MASUHIRO

International Classes:

C23C16/50; H01L21/205; H01L21/31; H05H1/24; (IPC1-7): C23C16/50; H01L21/205; H01L21/31; H05H1/24

Attorney, Agent or Firm:

Heiyoshi Odashima

Next Patent: PLASMA VAPOR DEPOSITION METHOD