Title:
PRODUCTION OF RESIN COMPOSITION OF EXCELLENT IMPACT RESISTANCE
Document Type and Number:
Japanese Patent JPH0565326
Kind Code:
A
Abstract:
PURPOSE:To obtain a resin composition markedly improved in impact resistance and excellent in heat resistance and solvent resistance by mixing modified polyphenylene ether with polyphenylene sulfied, a thermoplastic elastomer and a polyisocyanate in a specified ratio in specified order. CONSTITUTION:The objective resin composition comprises polyphenylene ether (A) modified with a 3-10C unsaturated carboxylic acid or its anhydride, a polyhphenylene disulfide (B), a thermoplastic elastomer (C) and a polyisocyanate compound (D). The mixing ratio A/B by weight is 10:90 to 70:30, the mixing ratio C/(A+B+C+D) 1-50%, and the mixing ratio D/(A+B+C+D) 0.01-5%, and the mixing order is such that component B is melt-kneaded with component C, and components A and D are added to the mixture and melt-kneaded.
Inventors:
SANADA DAISUKE
SHIMAOKA GORO
UNO HIDEO
SHIMAOKA GORO
UNO HIDEO
Application Number:
JP21915391A
Publication Date:
March 19, 1993
Filing Date:
August 05, 1991
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO
International Classes:
C08G18/48; C08G18/52; C08L23/00; C08L71/12; C08L81/02; C08L87/00; (IPC1-7): C08G18/48; C08G18/52; C08L23/00; C08L71/12; C08L81/02
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