Title:
ELECTRON CYCROTRON RESONANCE PLASMA CVD EQUIPMENT
Document Type and Number:
Japanese Patent JP3021117
Kind Code:
B2
Abstract:
PURPOSE: To obtain an ECR plasma CVD equipment capable of forming a uniform thin film.
CONSTITUTION: Microwaves generated by a microwave oscillator 100 is made to propagate in a waveguide 103 via a microwave branching filter 101, an isolator 102 and a stub tuner 107, and introduced into a cavity chamber 108. Said microwaves are supplied to metal plates 113 provided with slits in a plasma generating chamber 204, via a dipole antenna 109, coaxial cables 110, 112 and coaxial connectors 111, and generates plasma. Electron cycrotron resonance is induced by generating magnetic field with a magnetic coil 214. Thereby reaction gas is dissociated in a reaction chamber 208, and product is deposited. In the above electron cycrotron resonance plasma CVD equipment, the two metal plates 113 provided with slits are arranged so as to face each other in the plasma generating chamber and supplying points of microwaves to the two metal plates 113 provided with slits are arranged at diagonal positions.
Inventors:
Yoshinobu Kawai
Yoshiaki Takeuchi
Masayoshi Murata
Yoshiaki Takeuchi
Masayoshi Murata
Application Number:
JP24119591A
Publication Date:
March 15, 2000
Filing Date:
September 20, 1991
Export Citation:
Assignee:
MITSUBISHI HEAVY INDUSTRIES,LTD.
International Classes:
C23C16/50; C23C16/27; C23C16/511; G01N24/14; G01R33/64; H01L21/205; H01L21/31; H01L21/316; H05H1/18; (IPC1-7): H01L21/205; C23C16/50; G01R33/64; H01L21/31; H01L21/316; H05H1/18
Domestic Patent References:
| JP2170978A |
Attorney, Agent or Firm:
Takehiko Suzue