X-RAY EXPOSURE APPARATUS - Mitsubishi Electric Corporation

Title:

X-RAY EXPOSURE APPARATUS

Document Type and Number:

Japanese Patent JP3027240

Kind Code:

B2

Abstract:

PURPOSE: To obtain an X-ray exposure apparatus in which an incident position can constantly be maintained without applying disturbance to a radiation light incident in a predetermined incident position when a synchrotron radiation light is made incident the incident position.
CONSTITUTION: Radiation light position detectors 8, 9, 10 are provided for parts of a radiation light having a spread regulated by a slit 2, which are not incident on a planar mirror 3. A microcomputer 17 receives pieces of positional information of radiation surfaces from the detectors 8, 9, 10. The microcomputer 17 calculates positional deviation from the information, applies a control signal for correcting the deviation to a six-axis driving mechanism 18 so that the radiation light is always incident in a predetermined position of an X-ray mask 5.

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Inventors:

Hitoshi Kametani
Hifumi Takashi

Application Number:

JP20568291A

Publication Date:

March 27, 2000

Filing Date:

July 23, 1991

Export Citation:

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Assignee:

Mitsubishi Electric Corporation

International Classes:

G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20

Domestic Patent References:

JP63138731A
JP3222299A

Attorney, Agent or Firm:

Hiroaki Tazawa (2 outside)

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