Title:
PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION OF PHOTOSENSITIVE ELEMENT AND RESIST PATTERN USING THE SAME
Document Type and Number:
Japanese Patent JPH0756338
Kind Code:
A
Abstract:
PURPOSE: To provide a photosensitive resin compsn. enhancing the strength of a tinting film and the peelability of a resist.
CONSTITUTION: This photosensitive resin compsn. contains a graft polymer having an acid value of 20-300 obtd. by bringing acrylic acid and/or methacrylic acid and a macromonomer having one polymerizable unsatd. group at one terminal of a dimethylsiloxane polymer as essential components into copolymn., a monomer having two or more photopolymerizable unsatd. bonds in one molecule and a photopolymn. initiator. A photosensitive element and a resist pattern are produced using this photosensitive resin compsn.
Inventors:
TACHIKI SHIGEO
SAWABE MASARU
NAKAMURA MITSUYOSHI
SAWABE MASARU
NAKAMURA MITSUYOSHI
Application Number:
JP20353893A
Publication Date:
March 03, 1995
Filing Date:
August 18, 1993
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/027; G03F7/028; G03F7/033; G03F7/038; G03F7/075; G03F7/11; G03F7/30; H05K3/00; (IPC1-7): G03F7/033; G03F7/027; G03F7/028; G03F7/038; G03F7/075; G03F7/11; G03F7/30; H05K3/00
Attorney, Agent or Firm:
Kunihiko Wakabayashi
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