HIGH DENSITY PLASMA TREATING DEVICE

Title:

HIGH DENSITY PLASMA TREATING DEVICE

Document Type and Number:

Japanese Patent JPH0722195

Kind Code:

A

Abstract:

PURPOSE: To provide a high density plasma processing device having a closed processing chamber structure. CONSTITUTION: A plasma processing device 300 applies a toroidal magnetic field forming a confined magnetic field line 308 to a plasma discharge 310. This prevents magnetized plasma electrons passing along the magnetic field line 308 from diffusing toward a chamber wall or neighboring magnetic field lines. The plasma processing device 300 provided within a plurality of toroidal solenoid coils 304 includes a plasma processing chamber 302 forming a structure having several plasma source regions 306.

Inventors:

MANOOJIYU DARUBUII
SATOSHI HAMAGUCHI

Application Number:

JP283193A

Publication Date:

January 24, 1995

Filing Date:

January 11, 1993

Export Citation:

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Assignee:

IBM

International Classes:

C23C16/50; C23C16/511; C23F4/00; H01J37/32; H01L21/205; H01L21/302; H01L21/3065; H05H1/46; (IPC1-7): H05H1/46; C23C16/50; C23F4/00; H01L21/205; H01L21/3065

Domestic Patent References:

JPS611024A	1986-01-07
JPH02260399A	1990-10-23

Attorney, Agent or Firm:

Koichi Tonmiya (4 outside)

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