Title:
GAS PRESSURE CONTROLLER AND CONTROLLING METHOD FOR GAS PRESSURE
Document Type and Number:
Japanese Patent JPH0613327
Kind Code:
A
Abstract:
PURPOSE: To accurately control the partial pressure of treating gas in a vacuum chamber.
CONSTITUTION: A gas pressure controller is composed of a mass analyzer 6, a control unit 4 and a mass flow 5. A presence ratio of treating gas to other gas component in a vacuum chamber 1 is detected by the analyzer 6 and the gas is so supplied to the chamber 1 from the mas flow 5 that the partial pressure of treating gas in the chamber 1 becomes a predetermined value by a control signal generated from the unit 4 in response to its data. When this is applied to a semiconductor manufacturing apparatus, a film of a predetermined thickness controlled accurately on a substrate can be formed.
Inventors:
KOBA YOSHIMASA
Application Number:
JP16935592A
Publication Date:
January 21, 1994
Filing Date:
June 26, 1992
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): H01L21/205; H01L21/302
Attorney, Agent or Firm:
Takada Mamoru
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