Title:
【発明の名称】X線マスクによるパターン転写方法および装置
Document Type and Number:
Japanese Patent JP3019264
Kind Code:
B2
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Inventors:
Shigeru Okamura
Application Number:
JP22527390A
Publication Date:
March 13, 2000
Filing Date:
August 29, 1990
Export Citation:
Assignee:
富士通株式会社
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP61180440A | ||||
| JP63284812A | ||||
| JP21905A | ||||
| JP217627A |
Attorney, Agent or Firm:
Yasufumi Fukushima