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Title:
FINE MACHINING METHOD
Document Type and Number:
Japanese Patent JPH0631635
Kind Code:
A
Abstract:

PURPOSE: To accelerate machining and easily control the machining quantity by specifying the ratio between the diameter of a fine grain and the width of a fine pattern in machining the surface of a ceramic substrate.

CONSTITUTION: Fine patterns each 3 having the width of 2-200μm are formed on a mask 2 having the thickness of about 2-100μm to cover a substrate 1. Fine grains 5 of alumina having the diameter of about 0.6-50μm are ejected from a nozzle 4 to collide with the mask 2, and fine machining is applied to the substrate 1 via the fine patterns 3. The diameter of the fine grain 5 is set to 0.1-0.3 times the width of the fine pattern 3. The substrate 1 and the mask 2 are moved in the X-X direction, and the nozzle 4 is moved in the Y-Y direction for machining. The machining quantity (difference between the surface heights before and after the machining of the substrate 1) is made smaller as the diameter of the fine grain 5 is made smaller.


Inventors:
FUKUTANI AKIHITO
Application Number:
JP18593292A
Publication Date:
February 08, 1994
Filing Date:
June 19, 1992
Export Citation:
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Assignee:
SONY CORP
International Classes:
B24C1/04; B24C11/00; (IPC1-7): B24C11/00; B24C1/04
Attorney, Agent or Firm:
Yoshio Inamoto



 
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