Title:
【発明の名称】パタ―ン化超電導膜の製造方法
Document Type and Number:
Japanese Patent JP2524421
Kind Code:
B2
Abstract:
PURPOSE:To enable the superconductive film in fine pattern to be formed by a method wherein conductive thin films biasing positive potential at specific interval close to the conductive thin films forming the superconductive film are formed on an insulating substrate. CONSTITUTION:Within a substrate 1, conductive thin film electrodes 6a comprising silver(Ag) thin film in the shape of objective superconductive film together with conductive thin film electrode 6b close to the electrodes 6a at specific intervals are formed on the surface of crystallized insulating substrate 7. The substrate 1 formed of the electrodes 6a, 6b and dispersing solution 2 are sued for a film forming device while the superconductive fine particles dispersed in said acetate (dispersing solution 2) are electrophretically deposited on the electrodes 6a by impressing the electrodes 6a, 6b with voltage of 100V for 5 minutes through the intermediary of electrode pads 3a, 3b. Later, the deposited film together with the substrate 1 are sintered by heat treatment at 900 deg.C for one hour in air and then the oxygen composition is controlled by successively lowering the heat treatment temperature to 450 deg.C for 3 hours to be slowly cooled-down to room temperature.
Inventors:
SHINTAKU HIDETAKA
NOJIMA HIDEO
KOBA MASAYOSHI
NOJIMA HIDEO
KOBA MASAYOSHI
Application Number:
JP14508590A
Publication Date:
August 14, 1996
Filing Date:
May 31, 1990
Export Citation:
Assignee:
SHARP KK
International Classes:
C25D13/02; H01B12/06; H01B13/00; H01L39/24; (IPC1-7): H01L39/24; C25D13/02; H01B12/06; H01B13/00
Domestic Patent References:
| JP1169816A | ||||
| JP2130968A |
Attorney, Agent or Firm:
Umeda Masaru (2 outside)