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Title:
HYPERFINE PARTICLE LOW RESISTANT TIN DOPE INDIUM OXIDE POWDER AND PRODUCTION THEREOF
Document Type and Number:
Japanese Patent JP3019551
Kind Code:
B2
Abstract:

PURPOSE: To provide hyperfine particle low resistant tin dope indium oxide powder and production thereof.
CONSTITUTION: Mixed water solution of indium chloride and tin chloride and ammonium carbonate are mixed to coprecipitate hydroxides of indium and tin at 5-95°C under the conditions that the final pH is 2-8 and the precipitate is heat-decomposed, causing hyperfine particle low resistant tin dope indium oxide powder (ITO powder) having 0.005-0.3 Sn/In composition ratio ≥10m2/g specific surface area (BET value), ≤70Ωcm specific resistance, ≤0.1% impurity chlorine, ≤10ppm impurity sodium and potassium and ≤10ppm free indium and tin. Since the ITO powder is hyperfine particles of ≤0.08μm particle diameter, preferably of ≤0.03μm and has high conductivity of ≤70Ωcm, preferably of ≤15Ωcm, resin or coating material where the powder is dispersed has excellent transparency and conductivity to get resin or a conductive coated film without deterioration with the elapse of time such as discoloration.


Inventors:
Toshiharu Hayashi
Akira Nishihara
Application Number:
JP29393191A
Publication Date:
March 13, 2000
Filing Date:
October 15, 1991
Export Citation:
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Assignee:
Mitsubishi Materials Corporation
International Classes:
C01G15/00; C01G19/00; H01B1/00; H01B1/08; H01B1/14; H01B5/00; (IPC1-7): C01G15/00; C01G19/00; H01B1/00; H01B1/08; H01B5/00
Domestic Patent References:
JP3215318A
JP6487519A
JP354114A
JP627627A
Attorney, Agent or Firm:
Shoichi Hirose (2 outside)