Title:
TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP3013009
Kind Code:
B2
Abstract:
PURPOSE: To realize uniform coating of treatment liquid on a workpiece and prevent contamination of the workpiece by preventing generation of particles at the end portion of a nozzle hole of the treatment liquid supply nozzle when it is unused.
CONSTITUTION: A nozzle holding body 31 which keeps tightly closed condition with a nozzle hole of the treatment liquid supply nozzle 21 located at an internal space 33 and an inactive gas supply source 36 connected to an inactive gas supply port 34 opened at the internal space 33 of the nozzle holding body 31 are provided within a waiting means 30 to hold the treatment liquid supply nozzle 21 when it is unused. Under the condition that the treatment liquid supply nozzle 21 is kept in the tightly closed condition with the nozzle holding body 32, the internal space 33 is filled with the N2 gas from the inactive gas supply source 36. Thereby, generation of particles can be prevented by impeding reaction between the treatment liquid adhered to the end portion of the nozzle hole and CO2 gas.
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Inventors:
Keizo Hasebe
Koji Ito
Katsuya Okumura
Koji Ito
Katsuya Okumura
Application Number:
JP1837292A
Publication Date:
February 28, 2000
Filing Date:
January 08, 1992
Export Citation:
Assignee:
東京エレクトロン株式会社
株式会社東芝
株式会社東芝
International Classes:
B05C5/00; B05C11/08; G03F7/16; H01L21/027; (IPC1-7): H01L21/027; B05C5/00; B05C11/08; G03F7/16
Domestic Patent References:
| JP56854A |
Attorney, Agent or Firm:
Kikuhiko Nakamoto