Title:
【発明の名称】感光性樹脂組成物、これを用いた感光性エレメント及びめっきレジストの製造法
Document Type and Number:
Japanese Patent JP3006253
Kind Code:
B2
Abstract:
PURPOSE:To enhance photosensitivity, resolution, and plating resistance by incorporating a specified unsaturated linear polymer and an acid anhydride- modified epoxy acrylate compound. CONSTITUTION:This composition is obtained by copolymerizing 100 pts.wt. of a monomer mixture comprising 7-45 pts.wt. of a vinyl monomer of formula I, 30-70 pts.wt. of a vinyl monomer of formula II, 7-30 pts.wt. of a vinyl monomer of formula III having a carboxyl group other than that of the first monomer, and 0-40 pts.wt. of a vinyl monomer of formula IV except those of formulae I-III, allowing a compound having an oxyrane ring and an ethylenically unsaturated bond to react with this copolymer to produce an unsaturated linear polymer, allowing a novolak type epoxy resin and an unsaturated carboxylic acid to additionally react with this linear polymer, and further a polybasic acid anhydride to react with it to form the acid-modified epoxy acrylate compound, and incorporating it and a photopolymerizable compound having >=2 terminal ethylene groups and a sensitizer. In formulae I and II, R1 is H or methyl; R2 is alkylene; R3 is H, halogen, or the like; and R4 is H, alkyl, or the like.
Inventors:
Shinji Tsuchikawa
Fumihiko Ohta
Akio Nakano
Toshiaki Ishimaru
Fumihiko Ohta
Akio Nakano
Toshiaki Ishimaru
Application Number:
JP1390492A
Publication Date:
February 07, 2000
Filing Date:
January 29, 1992
Export Citation:
Assignee:
Hitachi Chemical Co., Ltd.
International Classes:
C08F299/02; G03F7/027; G03F7/028; G03F7/033; G03F7/038; H01L21/027; G03F7/004; H05K3/06; H05K3/18; (IPC1-7): G03F7/038; G03F7/004; G03F7/027; G03F7/028; G03F7/033; H05K3/18
Domestic Patent References:
| JP2166452A | ||||
| JP1179935A | ||||
| JP61285449A | ||||
| JP3172301A | ||||
| JP6234152A | ||||
| JP63261254A | ||||
| JP3221956A | ||||
| JP5299810A | ||||
| JP63147159A |
Attorney, Agent or Firm:
Kunihiko Wakabayashi