PATTERN FORMATION METHOD AND THIN FILM MAGNETIC HEAD

Title:

PATTERN FORMATION METHOD AND THIN FILM MAGNETIC HEAD

Document Type and Number:

Japanese Patent JPH0513323

Kind Code:

A

Abstract:

PURPOSE: To patternize the film on a high-step substrate accurately by physical etching such as ion milling, etc.

CONSTITUTION: Patterns are transcribed in order by a laminate of a photosensitive deposited film 1, an Si film 4, and a carbon film 3, whereby the film 2 to be processed at the lower layer is made possible of etching with high accuracy. Since the deposited film is excellent in step coverage, the thickness of the resist can be thinned in the recess at the step, so it has the effect of preventing the readhesion in ion milling and improving dimensional accuracy.

Inventors:

TAKEMOTO KAZUNARI
AMATATSU ATSUSHI
SONOBE HIDEKI
IKEDA HIROSHI

Application Number:

JP15436591A

Publication Date:

January 22, 1993

Filing Date:

June 26, 1991

Export Citation:

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Assignee:

HITACHI LTD

International Classes:

C08J7/00; C23C14/12; C23F4/00; G11B5/31; H01L21/027; H01L21/302; H01L21/3065; (IPC1-7): C08J7/00; C23C14/12; C23F4/00; G11B5/31; H01L21/027; H01L21/302

Attorney, Agent or Firm:

Ogawa Katsuo

Next Patent: METHOD OF MEASURING STAGE POSITION