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Title:
【発明の名称】複合酸化物超電導薄膜の作製方法
Document Type and Number:
Japanese Patent JP2501609
Kind Code:
B2
Abstract:
PURPOSE:To obtain a superconducting thin film having excellent superconducting characteristics and uniform composition and texture, by combining specific elements and carrying out sputtering at a given substrate temperature to form a thin film of oxide. CONSTITUTION:In producing a thin film of superconductor of compound oxide containing at least one element alpha of element of group IIa of the periodic table, at least one element beta of element of group IIIa of the periodic table and at least one element gamma of element of groups Ib, IIb, IIIb, IVa and VIIIa of the periodic table, the following treatment is carried out. Namely, sputtering is carried out by using a combination of simple substances of the elements alpha, betaand gamma and/or oxides containing the elements alpha, beta and gamma as a target at 620-700 deg.C substrate temperature to form a thin film of oxide. MgO single crystal, SrTiO3 single crystal or ZrO2 single crystal is preferable as the substrate for forming the supercoducting thin film of compound oxide and the film forming plane of the MgO single crystal or SrTiO3 single crystal is especially preferably made into {001} plane or {0111} plane.

Inventors:
TANAKA SABURO
ITOZAKI HIDEO
HIGAKI KENJIRO
YATSU SHUJI
JODAI TETSUJI
Application Number:
JP33230387A
Publication Date:
May 29, 1996
Filing Date:
December 29, 1987
Export Citation:
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Assignee:
SUMITOMO ELECTRIC INDUSTRIES
International Classes:
H01L39/24; C01G1/00; C01G3/00; C23C14/08; C23C14/34; H01B12/00; H01B12/06; H01B13/00; (IPC1-7): C01G3/00; C01G1/00; C23C14/08; C23C14/34; H01B12/00; H01L39/24
Domestic Patent References:
JP6414820A
JP6419614A
JP6435819A
Attorney, Agent or Firm:
Takashi Koshiba



 
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