PURPOSE: To provide a drying section structure of a photosensitive material processing device, with which the increase in the amount of discharge gas is controlled by efficiently discharging the drying wind having comparatively high humidity after drying the photosensitive material and the needs of expanding the size of the device and raising the rating of the power source equipment, etc., that accompany an increase in the heater capacity of the device can be eliminated.
CONSTITUTION: The drying wind after drying a film, which is used in circulation, is introduced from the flank on the downstream side of and the bottom of the drying section 50 and transferred into the chamber 49. This drying wind has comparatively low humidity and is used in circulation without leading the drying section 50 into a high humidity state. On the other hand, the drying wind after drying the film in the upper part of the drying section 50 has comparatively high humidity and this high humidity drying wind after drying the film on the upstream side of the drying section 50 is discharged through the discharge duct 13A provided above the processing tanks. Thus the upstream side and the downstream side of the drying section 50, namely, high humidity drying wind and low humidity drying wind are separated and discharged (upstream side) and used in circulation (downstream side) respectively.
IKEDA ATSUSHI
NOZAWA YOSHIE
YAMAMOTO TAKERO
