PURPOSE: To provide the chemical amplification type resist material having excellent exactness of patterns and excellent controllability of pattern sizes.
CONSTITUTION: This resist material is composed to include a resin compsn. which is changed in solubility to an aq. alkaline soln. by an acid and an absorbance changeable acid generating agent which generates an acid simultaneously with degradation in absorbance by irradiation with UV rays or far UV rays. The resist material is otherwise composed to include an acid generating agent which generates an acid and a dyestuff compd. which is degraded in absorbance by the irradiation with the UV rays, etc., in addition with the resin compsn. A color fading reaction progresses during exposure by applying the exposure sufficient to generate the acid necessary for the change in the solubility of the resin compsn. to the patterns when this resist material is applied on a substrate 1 and the patterns 2A are formed by subjecting the resist material to a treatment, such as irradiation with the UV rays 4, etc., and therefore, there is no degradation in resolution even if the resist having low initial transmittance is used. The influence of the reflection from the substrate 1, such as standing wave and halation, is suppressed and the exact patterns 2A are formed.
ENDO MASATAKA
SASAKO MASARU
URANO FUMIYOSHI
SOKI TORU
WAKO PURE CHEM IND LTD