ナノレベル構造組成観察方法及び絶縁層が介在する多層膜構造体の製造方法

Title:

ナノレベル構造組成観察方法及び絶縁層が介在する多層膜構造体の製造方法

Document Type and Number:

Japanese Patent JP4762511

Kind Code:

B2

Abstract:

To provide a nanometer-level structure composition observing method, a manufacturing method of a multi-layer film structure having an interposed insulating layer, and a nanometer-level structure composition observing device, analyzing the microstructure composition in a wide range of a sample having the multi-layer thin film structure having an interposed insulating layer with high accuracy.

A plurality of projected structures 2 formed of the multi-layer film structure having the interposed insulating layer 3 are provided, and only in the projected structure 2 as an observation object, the upper and lower conductive parts 4, 5 are sequentially electrically short-circuited to perform observation.

Inventors:

Yasuyuki Goto
Fukuda Shindai

Application Number:

JP2004233186A

Publication Date:

August 31, 2011

Filing Date:

August 10, 2004

Export Citation:

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