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Title:
NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
Japanese Patent JP2010230715
Kind Code:
A
Abstract:

To provide a negative photosensitive lithographic printing plate developable with a chemical-free developing solution and improved in ink receptivity.

The negative photosensitive lithographic printing plate comprises a photosensitive layer containing a photo-radial generator and a water-soluble polymer, which has a vinyl-substituted phenyl group and is soluble with an aqueous solution having a pH equal to or less than 10, on a support, wherein the photosensitive layer further contains a compound comprising at least two structures expressed by general formula 1. In general formula 1, R1 represents a hydrogen atom, a halogen atom or an alkyl group; and R2 represents a hydrogen atom, halogen atom, an alkyl, unsaturated alkyl, aryl, heterocyclic, alkoxy, aryloxy, acyl, amino, hydroxyl, amide, mercapto, sulfo or cyano group.


Inventors:
HAGIWARA TAKAHIRO
SEIYAMA HIDEO
Application Number:
JP2009075104A
Publication Date:
October 14, 2010
Filing Date:
March 25, 2009
Export Citation:
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Assignee:
MITSUBISHI PAPER MILLS LTD
International Classes:
G03F7/027; C08F290/14; C08G61/02; G03F7/00; G03F7/038