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Title:
NEGATIVE PHOTOSETTING ELECTRODEPOSITION COATING COMPOUND RESIN COMPOSITION, ELECTRODEPOSITION COATING BATH, PRODUCTION OF RESIST PATTERN, ELECTRICALLY-CONDUCTIVE SUBSTRATE WITH PRODUCED RESIST PATTERN, PRODUCTION OF PRINTED CIRCUIT BOARD, PRINTED CIRCUIT BOARD AND DEVICE
Document Type and Number:
Japanese Patent JPH06287486
Kind Code:
A
Abstract:

PURPOSE: To obtain the subject composition having excellent flexibility of film, attaining high resolution, comprising a polymer prepared by neutralizing a (meth)acrylic acid copolymer with a basic organic compound, a specific photopolymerizable unsaturated compound and a water-insoluble photoinitiator.

CONSTITUTION: The objective polymer comprises (A) a polymer prepared by neutralizing a polymer prepared by copolymerizing acrylic acid and/or methacrylic acid, having 20-300 acid value, with a basic organic compound, (B) a photopolymerizable unsaturated compound of the formula (R1 and R2 are H or methyl; k, m and n are ≥0, k+m is ≥1 and k+m+n is 2-15) and (C) a water-insoluble photoinitiator (e.g. benzophenone). The compound of the formula, for example, is obtained by introducing ethylene oxide into water, reacting in the presence of an alkali catalyst and dehydrating a formed dialcohol with (meth)acrylic acid.


Inventors:
AMANOKURA HITOSHI
UEHARA HIDEAKI
TACHIKI SHIGEO
KATO TAKURO
TSUKADA KATSUSHIGE
YAMAZAKI YUJI
YAMADA MASAHARU
SHIOTANI TOSHIHIKO
NAGASHIMA YOSHIHISA
Application Number:
JP7263493A
Publication Date:
October 11, 1994
Filing Date:
March 31, 1993
Export Citation:
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Assignee:
DAINIPPON TORYO KK
HITACHI CHEMICAL CO LTD
International Classes:
C09D4/02; C09D5/44; C09D171/00; G03F7/027; G03F7/028; G03F7/038; G03F7/30; (IPC1-7): C09D5/44; C09D4/02; G03F7/027; G03F7/028; G03F7/038; G03F7/30
Attorney, Agent or Firm:
Kunihiko Wakabayashi