NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

Japanese Patent JP2006195050

A

To provide a negative resist composition suppressing swelling of a resist pattern and a resist pattern forming method.

The negative resist composition contains: (A) an alkali-soluble resin component; (B) an acid generator component which generates an acid upon exposure; and (C) a crosslinker component. The alkali-soluble resin component (A) is a copolymer (A1) including: a constitutional unit (a1) having an alicyclic group having a fluorinated hydroxyalkyl group in a backbone; a constitutional unit (a2) having a hydroxyl group-containing chain or cyclic alkyl group and derived from an acrylic ester having a fluorinated alkyl group or a fluorine atom bonding to the α-position; and a constitutional unit (a3) having an alicyclic group having a fluorinated hydroxyalkyl group, and derived from an acrylic ester having a fluorinated alkyl group or a fluorine atom, bonding to the α-position.

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IWASHITA ATSUSHI

JP2005005013A

July 27, 2006

January 12, 2005

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TOKYO OHKA KOGYO CO LTD

G03F7/038; C08F220/22; C08F232/08; G03F7/004; H01L21/027

Sumio Tanai
Masatake Shiga
Masakazu Aoyama
Suzuki Mitsuyoshi
Noriko Yanai

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