Title:
ネガ型レジスト組成物
Document Type and Number:
Japanese Patent JP4070393
Kind Code:
B2
Abstract:
A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid:
Inventors:
Yutaka Adegawa
Kazuya Uenishi
Koji Shirakawa
Kazuya Uenishi
Koji Shirakawa
Application Number:
JP2000235949A
Publication Date:
April 02, 2008
Filing Date:
August 03, 2000
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/038; C08F12/22; C08K5/00; C08L25/18; G03F7/004; H01L21/027
Domestic Patent References:
| JP5257283A | ||||
| JP2253262A | ||||
| JP2059750A | ||||
| JP10319596A | ||||
| JP6049136A | ||||
| JP6041222A |
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa
Kiyozumi Yazawa