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Title:
NEGATIVE TYPE PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JPH0667431
Kind Code:
A
Abstract:

PURPOSE: To provide a negative type photoresist compsn. fit for far UV (especially KrF excimer laser) lithography, excellent in various properties such as resolution, sensitivity, residual film rate, profile and heat resistance and having a small stationary wave effect.

CONSTITUTION: This negative type photoresist compsn. contains a resin obtd. by copolymerizing p-hydroxystyrene with styrene, a crosslinking agent represented by formula I (where Z is -NRR', etc., each of R, R' and R1-R4 is -CH2ORa, etc., and Ra is lower alkyl) and an acid generating agent represented by formula II (where each of Y3-Y5 is mono-, di- or tri-halogen substd. alkyl, etc.).


Inventors:
UEDA YUJI
TAKEYAMA HISAMOTO
UEKI HIROMI
KUSUMOTO TAKEHIRO
NAKANO YOSHIKO
Application Number:
JP1992000221374
Publication Date:
March 11, 1994
Filing Date:
August 20, 1992
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; G03F7/029; G03F7/038; H01L21/027; (IPC1-7): G03F7/038; G03F7/004; G03F7/029; H01L21/027
Attorney, Agent or Firm:
Takashi Kuboyama (1 person outside)