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Title:
NEGATIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPH01145649
Kind Code:
A
Abstract:

PURPOSE: To obtain a resist compsn. hardly generating fine particles by dissolving an alkali-soluble resin and an azido compd. in a solvent contg. monoxymonocarboxylic esters.

CONSTITUTION: An alkali-soluble resin and an azido compd. are dissolved in a solvent contg. monoxymonocarboxylic esters. The solvent is desirably a compd. represented by a formula R1O-R2-COOR3 (where R1 is H or 1W3C alkyl, R2 is 1W4C alkylene and R3 is 1W4C alkyl). A resin compsn. capable of reducing the number of fine particles generated and hardly undergoing a change in the performance as a resist can be obtd.


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Inventors:
HOSAKA YUKIHIRO
NOZUE IKUO
TAKATORI MASASHIGE
HARITA YOSHIYUKI
Application Number:
JP26203188A
Publication Date:
June 07, 1989
Filing Date:
October 18, 1988
Export Citation:
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Assignee:
JAPAN SYNTHETIC RUBBER CO LTD
International Classes:
G03C1/00; G03F7/004; G03F7/008; (IPC1-7): G03C1/00; G03C1/71
Domestic Patent References:
JPS55129341A1980-10-07
JPS5230504A1977-03-08
JPS58111939A1983-07-04
JPS5128001A1976-03-09
JPS56140342A1981-11-02
JPS5087022A1975-07-12
JPS5575758A1980-06-07
Attorney, Agent or Firm:
Kawakita Takecho



 
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