Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
NEGATIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPH01145649
Kind Code:
A
Abstract:

PURPOSE: To obtain a resist compsn. hardly generating fine particles by dissolving an alkali-soluble resin and an azido compd. in a solvent contg. monoxymonocarboxylic esters.

CONSTITUTION: An alkali-soluble resin and an azido compd. are dissolved in a solvent contg. monoxymonocarboxylic esters. The solvent is desirably a compd. represented by a formula R1O-R2-COOR3 (where R1 is H or 1W3C alkyl, R2 is 1W4C alkylene and R3 is 1W4C alkyl). A resin compsn. capable of reducing the number of fine particles generated and hardly undergoing a change in the performance as a resist can be obtd.


Inventors:
Hosaka, Yukihiro
Nozue, Ikuo
Takatori, Masashige
Harita, Yoshiyuki
Application Number:
JP1988000262031
Publication Date:
June 07, 1989
Filing Date:
October 18, 1988
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
JAPAN SYNTHETIC RUBBER CO LTD
International Classes:
G03C1/00; G03F7/004; G03F7/008; (IPC1-7): G03C1/00; G03C1/71
Domestic Patent References:
JPS55129341A
JPS5230504A
JPS58111939A
JPS5128001A
JPS56140342A
JPS5087022A
JPS5575758A
Attorney, Agent or Firm:
井桁 貞一