Title:
NEGATIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP3859352
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a negative type resist compsn. capable of using a basic aq. soln. as a developer, having practical sensitivity and capable of forming a non-swellable minute pattern and to provide a resist pattern forming method using the resist compsn.
SOLUTION: The resist compsn. contains a film forming polymer having alkali-soluble groups and soluble in a basic aq. soln., a compd. having a vinyl ether structure and a photo-acid generating agent which acts so that the compd. having a vinyl ether structure absorbs radiation for image formation and becomes a protective group for the alkali-soluble groups by degradation. The resist compsn. is soluble in the basic aq. soln., and when it is exposed, the exposed part is made alkali-insoluble and development can be carried out with the basic aq. soln.
Inventors:
Koji Nozaki
Ei Yano
Ei Yano
Application Number:
JP10662998A
Publication Date:
December 20, 2006
Filing Date:
April 16, 1998
Export Citation:
Assignee:
富士通株式会社
International Classes:
G03F7/038; G03F7/004; G03F7/039; G03F7/30; H01L21/027; (IPC1-7): G03F7/039; G03F7/004; G03F7/30; H01L21/027
Domestic Patent References:
| JP4330445A | ||||
| JP8272099A | ||||
| JP11218918A |
Attorney, Agent or Firm:
Takashi Ishida
Yoshio Yoshio
Toshio Toda
Masaya Nishiyama
Higuchi Souji
Yoshio Yoshio
Toshio Toda
Masaya Nishiyama
Higuchi Souji
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