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Title:
NEGATIVE TYPE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JPS63149636
Kind Code:
A
Abstract:

PURPOSE: To improve the coatability of a resist compsn. and to enhance sensitivity and definition by using a specific silicone compd. as an upper layer resist.

CONSTITUTION: A soln. of 1W50wt% silicone compd. expressed by the formula is used as the upper layer resist compsn. for a negative type resist having two- layered structure. In the formula, R denotes alkyl of 1W3C or alkenyl of 2W4C n denotes 10W100,000. The silicone compd. is obtd. by acetylating the polysilsesquioxane having a hydroxy group at the terminal. The compsn. consisting of a methyl isobutyl ketone soln. or the like of said silicone compd. has good preservable stability and coatability. The upper layer resist having the high sensitivity and high definition is thus obtd.


Inventors:
WATABE KEIJI
SAITO KAZUMASA
KAWASAKI YOKO
FUKUYAMA SHUNICHI
SHIBA SHOJI
Application Number:
JP29681286A
Publication Date:
June 22, 1988
Filing Date:
December 15, 1986
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G03F7/095; G03C1/00; G03F7/038; G03F7/075; H01L21/027; (IPC1-7): G03C1/00; G03C1/71
Domestic Patent References:
JPS61271293A1986-12-01
Attorney, Agent or Firm:
Aoki Akira



 
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