NERVE NETWORK ELEMENT - SEIKO EPSON CORP

Title:

NERVE NETWORK ELEMENT

Document Type and Number:

Japanese Patent JPH0218966

Kind Code:

A

Abstract:

PURPOSE: To seek to improve the integration degree of a nerve network by forming an amorphous Si layer and a manganese oxide layer vertically.

CONSTITUTION: A switch layer 4 consisting of a hydrogen absorbing amorhpous Si film, a manganese oxide film, or the like is laminated vertically through an insulating film 3 consisting of an SiO2 film or the like on an electrode 2. And a resistance layer 5 consisting of Ni-Cr, Ni-Ge, or the like is formed in series on the switch layer 4, and an electrode 6 is formed in the Y direction by the film of Ni, Al, or the like, in series with the resistance layer 5. Accordingly, it becomes such a shape that the switch layer 4 and the resistance layer 5 are formed in series vertically at an intersection between the electrode and the electrode 6, and a resistor R and a switch SW come to be connected in series. Hereby, the integration degree of a nerve network can be improved.

Inventors:

IWAMATSU SEIICHI

Application Number:

JP16959188A

Publication Date:

January 23, 1990

Filing Date:

July 07, 1988

Export Citation:

Click for automatic bibliography generation Help

Assignee:

SEIKO EPSON CORP

International Classes:

H01L21/8247; H01L29/66; H01L29/78; H01L29/788; H01L29/792; H01L29/86; H01L49/02; (IPC1-7): H01L29/66; H01L29/78; H01L29/788; H01L29/792; H01L29/86; H01L49/02

Attorney, Agent or Firm:

Masanori Ueyanagi (1 outside)

Next Patent: THIN FILM SEMICONDUCTOR DEVICE