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Title:
NEW AMPHIPATHIC ELASTOMERIC BLOCK COPOLYMER FOR PRODUCTION OF LITHOGRAPHIC PLATE
Document Type and Number:
Japanese Patent JPH0710941
Kind Code:
A
Abstract:

PURPOSE: To provide an amphipathic elastomeric block copolymer useful for obtaining a lithographic plate excellent in developing, ink absorbency, etc., by forming a copolymer containing specified blocks under specified conditions.

CONSTITUTION: This copolymer contains at least 20 wt.% hydrophobic soft blocks (A) having a glass transition temperature (Tg) of below -30°C, preferably formed from a conjugated diene (e.g. isoprene), 30-60 wt.% hydrophilic hard blocks containing acidic groups, having a Tg of above +30°C, preferably formed from an α,β-ethylenically unsaturated carboxylic acid (e.g. methacrylic acid), 0-79 wt.% hydrophobic soft blocks having a Tg of above +50°C, preferably formed from an aromatic vinyl compound (e.g. styrene), and fundamentally branched or crosslinked homopolymer blocks obtained from units comprising a compound containing at least two vinyl or isopropenyl groups (e.g. trimethyloporpane trimethacrylate), wherein the weight percentage of component A is specified.


Inventors:
UIRII KURUTO GURIISU
Application Number:
JP10195793A
Publication Date:
January 13, 1995
Filing Date:
April 05, 1993
Export Citation:
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Assignee:
HOECHST AG
International Classes:
C08F297/00; C08F297/02; C08F297/04; G03F7/033; G03G5/05; (IPC1-7): C08F297/00; G03G5/05
Domestic Patent References:
JPH01131221A1989-05-24
JPS4935349A1974-04-01
JPH0641256A1994-02-15
Attorney, Agent or Firm:
Kazuo Sato (2 outside)