To provide a method for manufacturing a photoresist composition capable of forming a resist pattern having excellent characteristics, a compound providing such a photoresist composition, resin and resist pattern.
The compound is expressed by formula (VII), wherein R0 is H or a methyl group, X21 and X22 are a divalent saturated hydrocarbons, and a methylene group contained in the group may be substituted with O or -CO-, but at least one of the methylene group contained in the X21 and X22 is substituted with -CO-. R21 and R22 are -C(R1R)(R2R)(R3R) group, alicyclic or aromatic hydrocarbon which may be have a substituted group, and the methylene group in the alicyclic hydrocarbon group may be substituted with O, -CO-, S or -SO2-. R1R, R2R and R3R are alkyl groups.
ICHIKAWA KOJI
ADACHI YUKAKO
YOSHIDA ISAO
