Title:
NEW ESTER COMPOUND, MACROMOLECULAR COMPOUND, RESIST MATERIAL, AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2007153982
Kind Code:
A
Abstract:
To provide a resist material having excellent resolution, transparency and etching resistance in ArF exposure, and exhibiting the high performance even in ArF-immersion lithography.
The resist material contains a repeating unit (2) obtained by the polymerization of a compound of general formula (1) (in the formulas, R1 is F or a fluorinated alkyl group; R2 is H or an alkyl group; R3 is O or an alkylene group; R4 and R5 are each H, an alkyl group or a fluorinated alkyl group; and R6 is H or an acid-unstable group).
Inventors:
HARADA YUJI
HATAKEYAMA JUN
KAWAI YOSHIO
SASAKO MASARU
ENDO MASATAKA
MAEDA KAZUHIKO
KOMORIYA HARUHIKO
OTANI MITSUTAKA
HATAKEYAMA JUN
KAWAI YOSHIO
SASAKO MASARU
ENDO MASATAKA
MAEDA KAZUHIKO
KOMORIYA HARUHIKO
OTANI MITSUTAKA
Application Number:
JP2005349110A
Publication Date:
June 21, 2007
Filing Date:
December 02, 2005
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
MATSUSHITA ELECTRIC IND CO LTD
CENTRAL GLASS CO LTD
MATSUSHITA ELECTRIC IND CO LTD
CENTRAL GLASS CO LTD
International Classes:
C08F20/28; C07D307/93; C07D493/18; C08F220/28; C08F232/08; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2002351078A | 2002-12-04 | |||
| JP2005234015A | 2005-09-02 | |||
| JP2005314662A | 2005-11-10 | |||
| JP2006022308A | 2006-01-26 | |||
| JP2002169289A | 2002-06-14 | |||
| JP2005240024A | 2005-09-08 | |||
| JP2006234938A | 2006-09-07 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa