Title:
NEW GRAFT RESIN AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3715733
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain the subject resin having good low-temperature forming property and applicable to a resin modifier, etc., and having a new structure.
SOLUTION: This resin has a structure of formula I [R is hydrogen, benzoic acid residue or a ≤4C fatty acid residue; R' is a ≥12C fatty acid residue; (k) is 0-0.6; (m) and (n) are each ≥0 and (n)/(m+n) is 0.20 to 0.85; (k+m+n)=1.0; (x) is average polymerization degree] and has 2,000 to 50,000 number-average molecular weight. In the graft resin, the temperature difference between endothermic peak temperature in a differential scanning calorimeter and a Kouka-type flow tester is ≤50°C. The resin is obtained by subjecting a polymer of formula II (e.g. a partially saponified type polyvinyl alcohol) to condensation reaction with a fatty acid of formula III (R" is an ≥11C aliphatic group in which carboxyl group of R' represented by formula I is removed) (e.g. stearic acid or behenic acid) in the presence of a catalyst (e.g. sodium acetate) under nitrogen atmosphere at 150-290°C.
Inventors:
Toshio Tagami
Application Number:
JP32765296A
Publication Date:
November 16, 2005
Filing Date:
November 22, 1996
Export Citation:
Assignee:
Tomagawa Paper Mill Co., Ltd.
International Classes:
C08F8/14; (IPC1-7): C08F8/14
Domestic Patent References:
| JP48006195B1 | ||||
| JP7082317A | ||||
| JP36016040B1 | ||||
| JP61168603A | ||||
| JP60101103A |
Attorney, Agent or Firm:
Mamoru Takeuchi