To obtain the subject compound useful as a monomer for obtaining a high polymer compound used as a base resin of a resist material, sensitive to a high energy ray, excellent in sensitivity, resolution and etching resistance and useful for a fine processing with an electron beam or a far ultraviolet ray.
This lactone-containing compound is a compound of formula I [R1 is H, methyl, CH2COOR5 (R5 is a 1-18C alkyl); R2 is H, methyl or COOR5, R3 is a 1-8C alkyl; R4 is H or COOR5; X is CH2, CH2CH2, O or S], e.g. 5-oxo-4- oxatricyclo[4.2.1.03.7]nonane-2-yl methqcrylate. The compound of the formula I is obtained e.g. by performing an oxidation of a double bond accompanying with a lactone ring formation on a compound obtained by performing a Diels- Alder reaction of a compound of formula II with a compound of formula III, and further esterifying the obtained compound with a compound of formula IV.
NISHI TSUNEHIRO
KANOU TAKESHI
HATAKEYAMA JUN
WATANABE OSAMU
