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Patent Searching and Data


Title:
新規な(メタ)アクリル酸エステル化合物
Document Type and Number:
Japanese Patent JP4070297
Kind Code:
B2
Abstract:
The present invention provides a novel (meth)acrylic acid ester compound useful as a resin material for photosensitive compositions, which enables control of the molecular weight of a resin to be prepared. The novel (meth)acrylic acid ester compound is one represented by the following formula (I):wherein R1 and R2 each independently represent a hydrogen atom or a hydroxyl group; and R3 represents a hydrogen atom or a methyl group.

Inventors:
Kenichiro Sato
Toshiaki Aoi
Application Number:
JP7945498A
Publication Date:
April 02, 2008
Filing Date:
March 26, 1998
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
C07C69/54; C07J7/00; C07J9/00
Foreign References:
WO1998007449A1
Other References:
ZHANG, Y. H. et al.,Polymers made from cholic acid derivatives. Selected properties,Macromolecular Chemistry and Physics,1996年,Vol.197, No.10,p.3473-3482
ZHANG, Y. H. et al.,New synthetic polymers prepared from bile acid derivatives,Polymeric Materials Science and Engineering,1996年,Vol.74,p.145-146
DENIKE, J. K. et al.,Stereoselective synthesis of 3β-bile acid derivatives from the 3α-analog,Chemistry and Physics of Lipids,1995年,Vol.77, No.2,p.261-267
AHLHEIM, M. et al.,Radically polymerizable cholic acid derivatives in monolayers, micelles, and vesicles,Makromolekulare Chemie,1992年,Vol.193, No.3,p.779-797
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa