To obtain new compounds useful for raw materials of polymers capable of obtaining a resist film having high transparency to far-ultrariolet light, especially to ArF eximer laser or the like, and excellent in resistance against etching or the like.

The compounds are expressed by formula I [X' is a (substituted) cyclic hydrocarbon having polymerizable double bond; Z is a spacer or a bond; R is a substituted alkyl having one or two protected OH groups or a substituted alkenyl], for example, 5-norbornene-2-methyl 3-methoxy-2-butenoate. The compounds of formula I are obtained by carrying out the reaction of the compounds of formula II [R1 and R2 are each H or a (substituted) alkyl or a polycyclic aliphatic hydrocarbon or an aliphatic ring is formed by bonding R1 with R2 and bonding respective R1 and R2 with each neighboring carbon] and orthocarboxylates in the presence of an acid catalyst in the solvent of required.