Title:
NEW NAPHTHOL RESIN AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH0597977
Kind Code:
A
Abstract:
PURPOSE:To obtain a naphthol resin having a specific structure and suitable for matrix resin for composite material or a material for sealing having excel lent balance of heat resistance and water resistance. CONSTITUTION:A naphthol resin expressed by the formula [(n) is 0-100]. The resin is obtained by reacting naphthols with a dicyclopentadiene in the presence of an acid catalyst. As the naphthol resin, a resin of the formula[(n) is 0-20] having 70-180 deg.C softening point is preferably used. As the naphthol, alpha-naphthol or beta-naphthol is used in an amount of 1.1-10mol based on 1mol dicyclopentadiene.
Inventors:
YAMAGUCHI KEISABURO
URAGAMI TATSUNOBU
YAMAGUCHI TERUHIRO
URAGAMI TATSUNOBU
YAMAGUCHI TERUHIRO
Application Number:
JP26358691A
Publication Date:
April 20, 1993
Filing Date:
October 11, 1991
Export Citation:
Assignee:
MITSUI TOATSU CHEMICALS
International Classes:
C08G61/02; C08G61/00; (IPC1-7): C08G61/02
Next Patent: TONER DENSITY CONTROLLER