PURPOSE: To obtain a new compound excellent in solubility of a resist solution to solvents and compatibility with resins and useful for fine processing using radioactive rays including far-ultraviolet rays such as excimer laser.
CONSTITUTION: A compound of formula I or formula II [A is O or methylene; B is phenylene, naphtylene or anthorylene; D is SO3 or OSO3; X is monovalent aromatic organic group; Y is alkyl, cycloalkyl, phenacyl, etc.; Z is divalent organic group; m is 5-40; n is 0 or 1; a is 0-3 in the formula I and 0-2 in the formula II; b is 0-2; c is 0 or 1; (a+b+2c) is 3 in the formula I and (a+b+2c) is 2 in the formula II], e.g. benzyl-4-hydroxyphenyl- methylsulfoniumdodecylbenzenesulfonate. The compound of formula I is obtained by reacting, e.g. benzyl-4-hydroxyphenylmethylsulfonium chloride with sodium dodecylbenzenesulfonate, etc.
| JPS6165832 | TOLUENE RING CHLORINATION |
| WO/2001/079148 | METHOD OF MAKING BENZOYL HALIDES AND NITRILES |
SUZUKI MASAMUTSU
INOMATA KATSUMI
TSUJI AKIRA
