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Title:
NEW PHENOL DIMER CONDENSATE
Document Type and Number:
Japanese Patent JP2002030026
Kind Code:
A
Abstract:

To obtain a phenol dimer condensate containing a ≥4C straight-chain alkyl group or a halogen-substituted alkyl group, having a low crystal melting point, excellent solubility.

This phenol dimer condensate is obtained by subjecting a phenol compound represented by general formula (I) (R1 to R5 are each mutually independently a hydrogen atom, a hydrocarbon group, a substituted hydrocarbon group, a hydrocarbonoxy group, an amino group, a substituted amino group, a mercapto group, a substituted mercapto group or a halogen atom; R1 and R2, R2 and R3, R3 and R4 and/or R4 and R5 may form a ring, at least one of R1, R3 and R5 is a hydrogen atom and at least one of R1 to R5 is a ≥4C straight-chain alkyl group or halogen atom-substituted straight-chain alkyl group) to oxidative condensation.


Inventors:
Higashimura, Hideyuki
Kobayashi, Shiro
Application Number:
JP2000000216554
Publication Date:
January 29, 2002
Filing Date:
July 17, 2000
Export Citation:
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Assignee:
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY
JAPAN CHEMICAL INNOVATION INSTITUTE
International Classes:
C07C50/08; C07C37/11; C07C39/15; (IPC1-7): C07C50/08; C07C39/15
Domestic Patent References:
JPS63215652A
JPH02140740A
JPS3618692B1
JPH11343256A
JPS63273632A
Foreign References:
US3562338A
GB687293A
Attorney, Agent or Firm:
飯田 敏三