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Patent Searching and Data


Title:
NEW PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2002031888
Kind Code:
A
Abstract:

To provide a photosensitive resin composition for alkali developable DFR which retains flexibility of a cured film and adhesion to a substrate and has satisfactory plating resistance.

The photosensitive resin composition contains (A) a photopolymerizable unsaturated compound, (B) a binder polymer having a carboxyl group and (C) a photopolymerization initiator. The component (A) contains a compound of the formula CH2=CR-CO-O-(AO)a-(EO)b-(AO)c-CO-CR'= CH2 (where R and R' are each H or methyl; (a), (b) and (c) are each a number of 1-30; EO is oxyethylene, and (AO)a and (AO)c are each a polyoxyalkylene chain obtained by polymerizing a ≥3C alkylene oxide(AO) or copolymerizing EO and ≥3C AO) as an essential component. A photosensitive element obtained by applying and drying the photosensitive resin on a substrate is provided.


Inventors:
KAWAMATA TAIGA
KOMIYA KAORU
Application Number:
JP2000215767A
Publication Date:
January 31, 2002
Filing Date:
July 17, 2000
Export Citation:
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Assignee:
ASAHI DENKA KOGYO KK
International Classes:
G03F7/027; C08F2/44; C08F2/48; C08F290/06; (IPC1-7): G03F7/027; C08F2/44; C08F2/48; C08F290/06
Attorney, Agent or Firm:
Soga Doteru (6 people outside)