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Title:
NEW POLYMER AND CHEMICAL AMPLIFICATION TYPE RESIST COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2005194498
Kind Code:
A
Abstract:

To provide a new polymer capable of forming a resist useful for microprocessing using radiation and to provide a resist composition comprising the polymer.

The polymer is represented by formula 1 wherein X is one or more kinds of derivatives selected from the group consisting of a 3-30C vinyl ether derivative, a styrene derivative, a maleic anhydride derivative and an olefin derivative having no electron withdrawing functional group at a position of the double bond; R1 and R3 are each independently one or more kinds of groups selected from the group consisting of a hydrogen atom, a 1-30C alkyl group, a 1-30C alkoxy group, a halogen-substituted alkyl group and a halogen-substituted alkoxyalkyl group; and R2 is one or more kinds of groups selected from the group consisting of a hydrogen atom, a methyl group and a trifluoromethyl group.


Inventors:
Lim, Young-taek
Park, Joo-hyeon
Seo, Dong-chul
Kim, Chang-min
Cho, Seong-duk
Joo, Hyun-sang
Application Number:
JP2004000281651
Publication Date:
July 21, 2005
Filing Date:
September 28, 2004
Export Citation:
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Assignee:
KOREA KUMHO PETROCHEM CO LTD
International Classes:
G03F7/033; C08F212/08; C08F216/12; C08F220/10; C08F222/06; C08F232/00; C08G61/04; G03C1/76; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F212/08; C08F216/12; C08F220/10; C08F222/06; C08F232/00; G03F7/033; G03F7/039; H01L21/027
Attorney, Agent or Firm:
正林 真之
藤田 和子